Name: Tantalum powder
SIZE: 40-400mesh, micron
Tantalum metallurgical powder is mainly used for producing tantalum sputtering target, the third largest application for tantalum powder, following capacitors and superalloys, which is primarily used in semiconductor applications for high-speed data processing and for storage solutions in the consumer electronics industry.
Tantalum metallurgical powder is also used for processing into tantalum rod, bar, wire, sheet, plate..
The methods of preparing tantalum powder include metal thermal reduction of tantalum pentoxide, carbon reduction, molten salt electrolysis, hydrogen reduction of tantalum halide, metal thermal reduction and metal thermal reduction of tantalum containing fluoride complex. At present, tantalum powder is mainly prepared by sodium reduction of potassium flutantalate.
With malleability, high temperature resistance and corrosion resistance, tantalum powder is widely used in chemical industry, electronics, military, mechanical and aerospace industries, to manufacture electronic components, heat-resistant materials, corrosion-resistant equipment, catalysts, dies, advanced optical glass and so on.
Tantalum powder is also used in medical examination, surgical materials and contrast agents..